Porr CD-SAXS - GISAXS Bilder
The technique consists of collecting a series of transmission SAXS images, at a variety of aSxs rotation angles. The technique derives its name from CD-SEM, a realspace microscopy used measure the 'critical dimensions' of a structure.
CD-SEM is frequently used in the lithography and nanofabrication industry as a metrology for the quality of fabrication process.
Similarly, CD-SAXS is ideally suited to quantifying the average structure of well-defined entities such as lithographic line-gratings. In principle, this technique can quantify aspects of defects and disorder Cd Saxs.
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The technique consists of collecting a series of transmission SAXS images, at a variety of sample rotation angles. The technique derives its name from CD-SEM, a realspace microscopy used measure the 'critical dimensions' of a structure.
Overview presentation of critical dimension small angle X-ray scattering (CDSAXS) method being developed for the semiconductor industry for dimensional metrology of periodic nanostructures. Presentation was part of the X-ray Metrology for the Semiconductor Industry tutorial held at NIST on Aug. 25, Dr. R. Joseph Kline currently leads the Dimensional Metrology for Nanomanufacturing .
CD-SAXS Summary • Transmission SAXS – Non-destructive / no sample prep – Use mm scatterometry grating targets • Grazing incidence SAXS – Somewhat faster, much larger spot • High precision measurements – Sub-nm precision in pitch and linewidth – Sidewall angle & cross section – Corner rounding – linewidth distribution.